검색결과 : 14건
| No. | Article |
|---|---|
| 1 |
Control of surface mobility for conformal deposition of Mo-Si multilayers on saw-tooth substrates Voronov DL, Anderson EH, Gullikson EM, Salmassi F, Warwick T, Yashchuk VV, Padmore HA Applied Surface Science, 284, 575, 2013 |
| 2 |
Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning George SA, Naulleau PP, Mochi I, Salmassi F, Gullikson EM, Goldberg KA, Anderson EH Journal of Vacuum Science & Technology B, 28(6), C6E23, 2010 |
| 3 |
High transmission pellicles for extreme ultraviolet lithography reticle protection Shroff YA, Leeson M, Yan PY, Gullikson E, Salmassi F Journal of Vacuum Science & Technology B, 28(6), C6E36, 2010 |
| 4 |
Fabrication and performance of nanoscale ultrasmooth programed defects for extreme ultraviolet lithography Olynick DL, Salmassi F, Liddle JA, Mirkarimi PB, Spiller E, Baker SL, Robinson J Journal of Vacuum Science & Technology B, 26(1), 6, 2008 |
| 5 |
Multilayer phase-only diffraction gratings: Fabrication and application to extreme ultraviolet optics Salmassi F, Gullikson EM, Anderson EH, Naulleau PP Journal of Vacuum Science & Technology B, 25(6), 2055, 2007 |
| 6 |
Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks Liang T, Ultanir E, Zhang G, Park SJ, Anderson E, Gullikson E, Naulleau P, Salmassi F, Mirkarimi P, Spiller E, Baker S Journal of Vacuum Science & Technology B, 25(6), 2098, 2007 |
| 7 |
Extreme ultraviolet binary phase gratings: Fabrication and application to diffractive optics Salmassi F, Naulleau PP, Gullikson EM, Olynick DL, Liddle JA Journal of Vacuum Science & Technology A, 24(4), 1136, 2006 |
| 8 |
Scanning x-ray microscopy investigations into the electron-beam exposure mechanism of hydrogen silsesquioxane resists Olynick DL, Liddle JA, Tivanski AV, Gilles MK, Tyliszczak T, Salmassi F, Liang K, Leone SR Journal of Vacuum Science & Technology B, 24(6), 3048, 2006 |
| 9 |
Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic Naulleau PP, Goldberg KA, Anderson E, Cain JP, Denham P, Jackson K, Morlens AS, Rekawa S, Salmassi F Journal of Vacuum Science & Technology B, 22(6), 2962, 2004 |
| 10 |
Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects Naulleau P, Goldberg KA, Anderson EH, Bokor J, Gullikson E, Harteneck B, Jackson K, Olynick D, Salmassi F, Baker S, Mirkarimi P, Spiller E, Walton C, Zhang GJ Journal of Vacuum Science & Technology B, 21(4), 1286, 2003 |