화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Investigations on the mechanism of silicon etching with chlorine-trifluoride
Hochst A, Fischer F, Kirbach G, Urban A, Becker V, Irmscher M, Sailer H, Kern DP
Journal of Vacuum Science & Technology B, 23(5), 1936, 2005
2 High resolution electron beam lithography using a chemically amplified calix[4]arene based resist
Sailer H, Ruderisch A, Henschel W, Schurig V, Kern DP
Journal of Vacuum Science & Technology B, 22(6), 3485, 2004
3 Evaluation of calixarene-derivatives as high-resolution negative tone electron-beam resists
Sailer H, Ruderisch A, Kern DP, Schurig V
Journal of Vacuum Science & Technology B, 20(6), 2958, 2002