검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Film properties of low-k silicon nitride films formed by hexachlorodisilane and ammonia Tanaka M, Saida S, Tsunashima Y Journal of the Electrochemical Society, 147(6), 2284, 2000 |
| 2 |
Leakage Current Mechanism of Amorphous and Polycrystalline Ta2O5 Films Grown by Chemical-Vapor-Deposition Aoyama T, Saida S, Okayama Y, Fujisaki M, Imai K, Arikado T Journal of the Electrochemical Society, 143(3), 977, 1996 |