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In Situ Microscopic Cytometry Enables Noninvasive Viability Assessment of Animal Cells by Measuring Entropy States Wiedemann P, Guez JS, Wiegemann HB, Egner F, Quintana JC, Asanza-Maldonado D, Filipaki M, Wilkesman J, Schwiebert C, Cassar JP, Dhulster P, Suhr H Biotechnology and Bioengineering, 108(12), 2884, 2011 |
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The viability of animal cell cultures in bioreactors: Can it be estimated online by using in situ microscopy? Guez JS, Cassar JP, Wartelle F, Dhulster P, Suhr H Process Biochemistry, 45(2), 288, 2010 |
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Inline characterization of cell concentration and cell volume in agitated bioreactors using in situ microscopy: Application to volume variation induced by osmotic stress Camisard V, Brienne JP, Baussart H, Hammann J, Suhr H Biotechnology and Bioengineering, 78(1), 73, 2002 |
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Inline characterization of cell concentration and cell volume in agitated bioreactors using in situ microscopy: Application to volume variation induced by osmotic stress (vol 78, pg 73, 2002) Camisard V, Brienne JP, Baussart H, Hammann J, Suhr H Biotechnology and Bioengineering, 78(3), 353, 2002 |
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Reactions of nonequilibrium oxygen plasmas with liquid olefins Patino P, Sanchez N, Suhr H, Hernandez N Plasma Chemistry and Plasma Processing, 19(2), 241, 1999 |
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Non-contact online profile measuring system for the tyre industry Suhr H Kautschuk Gummi Kunststoffe, 51(12), 875, 1998 |
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In-Situ Microscopy for Online Characterization of Cell-Populations in Bioreactors, Including Cell-Concentration Measurements by Depth from Focus Suhr H, Wehnert G, Schneider K, Bittner C, Scholz T, Geissler P, Jahne B, Scheper T Biotechnology and Bioengineering, 47(1), 106, 1995 |
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Langmuir Probe Measurements During Plasma-Activated Chemical-Vapor-Deposition in the System Argon/Hydrogen/Dicyclopentadienyldimethylhafium Spatenka P, Petig M, Wiesemann K, Suhr H Plasma Chemistry and Plasma Processing, 15(3), 371, 1995 |
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PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF VANADIUM CARBIDE VC1-X AND VOX FROM VANADOCENE CP2V DEUTSCHMANN L, MESSELHAUSER J, SUHR H, HERRMANN WA, HARTER P Advanced Materials, 6(5), 392, 1994 |
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PLASMA-INDUCED CHEMICAL-VAPOR-DEPOSITION OF ZR(C,B) FROM CPZR(BH4)3 (CP = C5H5-CIRCLE-MINUS) REICH S, MESSELHAUSER J, SUHR H, ERKER G, FRITZE C Advanced Materials, 6(9), 674, 1994 |