검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Field oxide thinning behavior in local oxidation of silicon process under enhanced oxidation conditions Jang SA, Yeo IS, Kim YB Journal of the Electrochemical Society, 145(5), 1664, 1998 |
| 2 |
Oxide-Growth Enhancement Related to Annealing-Induced Arsenic Accumulation in the Si/SiO2 Interface Region Berger HH, Muller B, Jacob K Journal of the Electrochemical Society, 143(1), L15, 1996 |
| 3 |
Oxide-Growth Enhancement on Highly N-Type Doped Silicon Under Steam Oxidation Biermann E, Berger HH, Linke P, Muller B Journal of the Electrochemical Society, 143(4), 1434, 1996 |
| 4 |
Impact of Reactive Ion Etching Induced Carbon Contamination on Oxidation of Silicon Tsuchiaki M, Kvitek RJ, Parks C, Murphy RJ, Ohiwa T, Watanabe T Journal of the Electrochemical Society, 143(7), 2378, 1996 |
| 5 |
Characteristics of the Thermal-Oxidation of Heavily Boron-Doped Polycrystalline Silicon Thin-Films Boukezzata M, Bielledaspet D, Sarrabayrouse G, Mansour F Thin Solid Films, 279(1-2), 145, 1996 |
| 6 |
Oxidation-Enhanced Diffusion of Boron and Phosphorus in Heavily-Doped Layers in Silicon Roth DJ, Plummer JD Journal of the Electrochemical Society, 141(4), 1074, 1994 |