검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Utilization of TXRF analytical technique in order to improve front-end semiconductor processing Budri T Applied Surface Science, 254(15), 4768, 2008 |
| 2 |
Monitoring epiready semiconductor wafers Allwood DA, Cox S, Mason NJ, Palmer R, Young R, Walker PJ Thin Solid Films, 412(1-2), 76, 2002 |
| 3 |
A direct approach for evaluating the thermal condition of a silicon substrate under infrared rays and specular reflectors Habuka H, Otsuka T, Mayusumi M, Shimada M, Okuyama K Journal of the Electrochemical Society, 146(2), 713, 1999 |
| 4 |
Measurement of Silicon Particles by Laser-Surface Scanning and Angle-Resolved Light-Scattering Huff HR, Goodall RK, Williams E, Woo KS, Liu BY, Warner T, Hirleman D, Gildersleeve K, Bullis WM, Scheer BW, Stover J Journal of the Electrochemical Society, 144(1), 243, 1997 |
| 5 |
Particle deposition control for various wafer surfaces in acidic solution with surfactant Nose M, Itano M, Ohmi T Particulate Science and Technology, 14(1), 27, 1996 |