검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Electrical and plasma property measurements of a deep reactive ion etching Bosch process Abraham IC, Woodworth JR, Riley ME, Miller PA, Shul RJ, Willison CG Journal of Vacuum Science & Technology B, 21(3), 1112, 2003 |
| 2 |
Ion energy distributions at rf-biased wafer surfaces Woodworth JR, Abraham IC, Riley ME, Miller PA, Hamilton TW, Aragon BP, Shul RJ, Willison CG Journal of Vacuum Science & Technology A, 20(3), 873, 2002 |
| 3 |
Ion energy distributions versus frequency and ion mass at the rf-biased electrode in an inductively driven discharge Abraham IC, Woodworth JR, Riley ME, Miller PA, Hamilton TW, Aragon BP Journal of Vacuum Science & Technology A, 20(5), 1759, 2002 |
| 4 |
Absolute intensities of the vacuum ultraviolet spectra in oxide etch plasma processing discharges Woodworth JR, Riley ME, Arnatucci VA, Hamilton TW, Aragon BP Journal of Vacuum Science & Technology A, 19(1), 45, 2001 |
| 5 |
Ion Distribution-Functions in Inductively-Coupled Radio-Frequency Discharges in Argon-Chlorine Mixtures Woodworth JR, Riley ME, Miller PA, Nichols CA, Hamilton TW Journal of Vacuum Science & Technology A, 15(6), 3015, 1997 |