검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Chemically Amplified Photoresists for 193-Nm Photolithography: Effect of Molecular Structure and Photonic Parameters on Photopatterning Ridaoui H, Dirani A, Soppera O, Ismailova E, Brochon C, Schlatter G, Hadziioannou G, Tiron R, Bandelier P, Sourd C Journal of Polymer Science Part A: Polymer Chemistry, 48(6), 1271, 2010 |
| 2 |
Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances Chochos CL, Ismailova E, Brochon C, Leclerc N, Tiron R, Sourd C, Bandelier P, Foucher J, Ridaoui H, Dirani A, Soppera O, Perret D, Brault C, Serra CA, Hadziioannou G Advanced Materials, 21(10-11), 1121, 2009 |
| 3 |
Evolution of the surface polar character of pyrogenic silicas, with their grafting ratios by dimethylchlorosilane, studied by microcalorimetry Donnet JB, Ridaoui H, Balard H, Barthel H, Gottschalk-Gaudig T Journal of Colloid and Interface Science, 325(1), 101, 2008 |
| 4 |
Photopolymerization kinetic study of UV nanoimprint lithography dedicated resists Voisin P, Zelsmann M, Ridaoui H, Chouiki M, Gourgon C, Boussey J, Zahouily K Journal of Vacuum Science & Technology B, 25(6), 2384, 2007 |
| 5 |
First synthesis of a'1,2-diquinone-calix[4]arene'. Interaction of its reduced form with Ag+ Vataj R, Ridaoui H, Louati A, Gabelica V, Steyer S, Matt D Journal of Electroanalytical Chemistry, 519(1-2), 123, 2002 |