화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Application of deuterium exchange to analyze moisture uptake characteristics of porous low-dielectric-constant SiOCH films
Vinogradova E, Smith CE, Mueller DW, Reidy RF
Electrochemical and Solid State Letters, 11(9), H255, 2008
2 Effect of silylation on triethoxyfluorosilane xerogel films by means of atmospheric pressure drying
Orozco-Teran RA, Gorman BP, Mueller DW, Baklanov MR, Reidy RF
Thin Solid Films, 471(1-2), 145, 2005
3 Rapid repair of plasma ash damage in low-k dielectrics using supercritical CO2
Gorman BP, Orozco-Teran RA, Zhang Z, Matz PD, Mueller DW, Reidy RF
Journal of Vacuum Science & Technology B, 22(3), 1210, 2004
4 Drying and functionalization of triethoxyfluorosilane-based low-k dielectrics in CO2
Gorman BP, Mueller DW, Reidy RF
Electrochemical and Solid State Letters, 6(11), F40, 2003
5 Thermogravimetric Analysis of the Reaction of CeO2 with the NaVO3-SO3 System
Reidy RF, Jones RL
Journal of the Electrochemical Society, 142(4), 1353, 1995