화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Investigation of surface roughening of low-k films during etching using fluorocarbon plasma beams
Yin YP, Rasgon S, Sawin HH
Journal of Vacuum Science & Technology B, 24(5), 2360, 2006
2 Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
Goldfarb DL, Mahorowala AP, Gallatin GM, Petrillo KE, Temple K, Angelopoulos M, Rasgon S, Sawin HH, Allen SD, Lawson MC, Kwong RW
Journal of Vacuum Science & Technology B, 22(2), 647, 2004