화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Hexamethyldisilazane vapor treatment of plasma damaged nanoporous methylsilsesquioxane films: Structural and electrical characteristics
Rajagopalan T, Lahlouh B, Chari I, Othman MT, Biswas N, Toma D, Gangopadhyay S
Thin Solid Films, 516(10), 3399, 2008
2 Investigation on hexamethyldisilazane vapor treatment of plasma-damaged nanoporous organosilicate films
Rajagopalan T, Lahlouh B, Lubguban JA, Biswas N, Gangopadhyay S, Sun J, Huang DH, Simon SL, Toma D, Butler R
Applied Surface Science, 252(18), 6323, 2006
3 Post treatments of plasma-enhanced chemical vapor deposited hydrogenated amorphous silicon carbide for low dielectric constant films
Lahlouh B, Rajagopalan T, Biswas N, Sun J, Huang D, Simon SL, Lubguban JA, Gangopadhyay S
Thin Solid Films, 497(1-2), 109, 2006
4 Formation of highly oriented GeBiSe films from the as-deposited amorphous state by annealing
Rajagopalan T, Reddy GB
Thin Solid Films, 377-378, 501, 2000
5 Effect of annealing rate on the crystallization process in Ge5Bi18Se77 films
Rajagopalan T, Reddy GB
Thin Solid Films, 353(1-2), 254, 1999