| 1 |
Low temperature deposition of germanium on silicon using Radio Frequency Plasma Enhanced Chemical Vapor Deposition
Dushaq G, Rasras M, Nayfeh A
Thin Solid Films, 636, 585, 2017 |
| 2 |
Structural properties of hydrogenated microcrystalline silicon-carbon alloys deposited by Radio Frequency Plasma Enhanced Chemical Vapor Deposition: Effect of microcrystalline silicon seed layer and methane flow rate
Gaiaschi S, Ruggeri R, Johnson EV, Bulkin P, Chapon P, Gueunier-Farret ME, Mannino G, Longeaud C, Kleider JP
Thin Solid Films, 550, 312, 2014 |
| 3 |
Evolution of structural and optical properties of nanostructured silicon carbon films deposited by plasma enhanced chemical vapour deposition
Ambrosone G, Basa DK, Coscia U, Passacantando M
Thin Solid Films, 520(15), 4875, 2012 |
| 4 |
Characterization of thin TiO2 films prepared by plasma enhanced chemical vapour deposition for optical and photocatalytic applications
Sobczyk-Guzenda A, Gazicki-Lipman M, Szymanowski H, Kowalski J, Wojciechowski P, Halamus T, Tracz A
Thin Solid Films, 517(18), 5409, 2009 |
