검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Vacuum Requirements for Next Wafer Size Physical Vapor-Deposition System Hashim I, Raaijmakers IJ, Park SE, Kim KB Journal of Vacuum Science & Technology A, 15(3), 1305, 1997 |
| 2 |
Low-Temperature Metal-Organic Chemical-Vapor-Deposition of Advanced Barrier Layers for the Microelectronics Industry Raaijmakers IJ Thin Solid Films, 247(1), 85, 1994 |
| 3 |
Al Planarization Processes for Multilayer Metallization of Quarter Micrometer Devices Xu Z, Kieu H, Raaijmakers IJ, Tepman A Thin Solid Films, 253(1-2), 367, 1994 |
| 4 |
Kinetics and Conformality of Tin Films from Tdeat and Ammonia Cale TS, Chaara MB, Raupp GB, Raaijmakers IJ Thin Solid Films, 236(1-2), 294, 1993 |