| 1 |
Fluid simulation of a pulse-modulated, inductively coupled plasma discharge with radio frequency bias
Jeong Y, Lee YJ, Kwon DC, Choe H
Current Applied Physics, 17(3), 403, 2017 |
| 2 |
Study on mechanism of etching in low pressure radio-frequency plasmas
Dai ZL, Yue G, Wang YN
Current Applied Physics, 11(5), S121, 2011 |
| 3 |
Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma
Lee HC, Bang JY, Chung CW
Thin Solid Films, 519(20), 7009, 2011 |
| 4 |
Crystallinity and photocatalytic activity of TiO2 films deposited by reactive sputtering with radio frequency substrate bias
Song PK, Irie Y, Shigesato Y
Thin Solid Films, 496(1), 121, 2006 |
| 5 |
Direct fabrication of large-grain polycrystalline silicon thin films by RF-biased RF-PECVD at low temperature
Gu RD, Chen PL
Thin Solid Films, 498(1-2), 2, 2006 |
| 6 |
Low-temperature fabrication of silicon films by large-area microwave plasma enhanced chemical vapor deposition
Gu JD, Chen PL
Thin Solid Films, 498(1-2), 14, 2006 |
| 7 |
Simple method for ion current measurement at RF biased electrode
Kawata H, Yasuda M, Hirai Y
Thin Solid Films, 506, 683, 2006 |
