화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Langmuir probe measurements in a low pressure inductively coupled plasma used for diamond deposition
Okada K, Komatsu S, Matsumoto S
Journal of Vacuum Science & Technology A, 17(3), 721, 1999
2 Control of ion energy in a capacitively coupled reactive ion etcher
Park HM, Garvin C, Grimard DS, Grizzle JW
Journal of the Electrochemical Society, 145(12), 4247, 1998
3 Investigations in the sheath region of a radio frequency biased inductively coupled discharge
Benck EC, Schwabedissen A, Gates A, Roberts JR
Journal of Vacuum Science & Technology A, 16(1), 306, 1998
4 Ion energy distribution functions in inductively coupled radio-frequency discharges - Mixtures of Cl-2/BCl3/Ar
Nichols CA, Woodworth JR, Hamilton TW
Journal of Vacuum Science & Technology A, 16(6), 3389, 1998
5 Ion Distribution-Functions in Inductively-Coupled Radio-Frequency Discharges in Argon-Chlorine Mixtures
Woodworth JR, Riley ME, Miller PA, Nichols CA, Hamilton TW
Journal of Vacuum Science & Technology A, 15(6), 3015, 1997