검색결과 : 145건
No. | Article |
---|---|
1 |
Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning Ashby PD, Olynick DL, Ogletree DF, Naulleau PP Advanced Materials, 27(38), 5813, 2015 |
2 |
A Facile Route to Regular and Nonregular Dot Arrays by Integrating Nanoimprint Lithography with Sphere-Forming Block Copolymer Directed Self-Assembly Xiao SG, Yang XM, Hwu JJ, Lee KY, Kuo D Journal of Polymer Science Part B: Polymer Physics, 52(5), 361, 2014 |
3 |
Directing Convection to Pattern Thin Polymer Films Janes DW, Katzenstein JM, Shanmuganathan K, Ellison CJ Journal of Polymer Science Part B: Polymer Physics, 51(7), 535, 2013 |
4 |
Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early Tseng YC, Mane AU, Elam JW, Darling SB Advanced Materials, 24(19), 2608, 2012 |
5 |
Synthesis of (3-tert-butyl-4-hydroxy-5-methylphenyl) propionate derivatives and their thermal antioxidation behavior for POM Park D, Kobayashi D, Suh H, Cho Y, Lee A Journal of Applied Polymer Science, 124(2), 1731, 2012 |
6 |
Epoxidized perfluoropolyethers: A route to hydrophobic, negative-tone photoresists Chaffins S, Hinch G, DeKam K, Waterhous V, Smith J, Overbay M, Bilich D, Hovermale C, Jones J Journal of Applied Polymer Science, 124(6), 4636, 2012 |
7 |
Fracture toughness of a hybrid-rubber-modified epoxy. I. Synergistic toughening Abadyan M, Bagheri R, Kouchakzadeh MA Journal of Applied Polymer Science, 125(3), 2467, 2012 |
8 |
Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography Bauer WAC, Neuber C, Ober CK, Schmidt HW Advanced Materials, 23(45), 5404, 2011 |
9 |
Optimized Deep UV Curing Process for Metal-Free Dry-Etching of Critical Integrated Optical Devices Sengo G, Wolferen HAGM, Driessen A Journal of the Electrochemical Society, 158(10), H1084, 2011 |
10 |
Friendly to Environment Heterocyclic Adducts as Corrosion Inhibitors for Steel in Water-Borne Paints Mohamed HA, Farag AA, Badran BM Journal of Applied Polymer Science, 117(3), 1270, 2010 |