화학공학소재연구정보센터
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No. Article
1 Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning
Ashby PD, Olynick DL, Ogletree DF, Naulleau PP
Advanced Materials, 27(38), 5813, 2015
2 A Facile Route to Regular and Nonregular Dot Arrays by Integrating Nanoimprint Lithography with Sphere-Forming Block Copolymer Directed Self-Assembly
Xiao SG, Yang XM, Hwu JJ, Lee KY, Kuo D
Journal of Polymer Science Part B: Polymer Physics, 52(5), 361, 2014
3 Directing Convection to Pattern Thin Polymer Films
Janes DW, Katzenstein JM, Shanmuganathan K, Ellison CJ
Journal of Polymer Science Part B: Polymer Physics, 51(7), 535, 2013
4 Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early
Tseng YC, Mane AU, Elam JW, Darling SB
Advanced Materials, 24(19), 2608, 2012
5 Synthesis of (3-tert-butyl-4-hydroxy-5-methylphenyl) propionate derivatives and their thermal antioxidation behavior for POM
Park D, Kobayashi D, Suh H, Cho Y, Lee A
Journal of Applied Polymer Science, 124(2), 1731, 2012
6 Epoxidized perfluoropolyethers: A route to hydrophobic, negative-tone photoresists
Chaffins S, Hinch G, DeKam K, Waterhous V, Smith J, Overbay M, Bilich D, Hovermale C, Jones J
Journal of Applied Polymer Science, 124(6), 4636, 2012
7 Fracture toughness of a hybrid-rubber-modified epoxy. I. Synergistic toughening
Abadyan M, Bagheri R, Kouchakzadeh MA
Journal of Applied Polymer Science, 125(3), 2467, 2012
8 Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography
Bauer WAC, Neuber C, Ober CK, Schmidt HW
Advanced Materials, 23(45), 5404, 2011
9 Optimized Deep UV Curing Process for Metal-Free Dry-Etching of Critical Integrated Optical Devices
Sengo G, Wolferen HAGM, Driessen A
Journal of the Electrochemical Society, 158(10), H1084, 2011
10 Friendly to Environment Heterocyclic Adducts as Corrosion Inhibitors for Steel in Water-Borne Paints
Mohamed HA, Farag AA, Badran BM
Journal of Applied Polymer Science, 117(3), 1270, 2010