검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Top surface imaging process and materials development for 193 nm and extreme ultraviolet lithography Rao V, Hutchinson J, Holl S, Langston J, Henderson C, Wheeler DR, Cardinale G, O'Connell D, Goldsmith J, Bohland J, Taylor G, Sinta R Journal of Vacuum Science & Technology B, 16(6), 3722, 1998 |
| 2 |
Accurate critical dimension control by using an azide/novolak resist process for electron-beam lithography Yamamoto J, Uchino S, Ohta H, Yoshimura T, Murai F Journal of Vacuum Science & Technology B, 15(6), 2868, 1997 |