검색결과 : 19건
No. | Article |
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1 |
International round-robin inter-comparison of dye-sensitized and crystalline silicon solar cells Chen CY, Ahn SK, Aoki D, Kokubo J, Yoon KH, Saito H, Lee KS, Magaino S, Takagi K, Lin LC, Lee KM, Wu CG, Zhou H, Igari S Journal of Power Sources, 340, 309, 2017 |
2 |
Planar laser-induced fluorescence of CF2 in O-2/CF4 and O-2/C2F6 chamber-cleaning plasmas: Spatial uniformity and comparison to electrical measurements Steffens KL, Sobolewski MA Journal of Vacuum Science & Technology A, 17(2), 517, 1999 |
3 |
Langmuir probe measurements in a low pressure inductively coupled plasma used for diamond deposition Okada K, Komatsu S, Matsumoto S Journal of Vacuum Science & Technology A, 17(3), 721, 1999 |
4 |
Advances in broadband radio-frequency sensing for real-time control of plasma-based semiconductor processing Garvin C, Grimard DS, Grizzle JW Journal of Vacuum Science & Technology A, 17(4), 1377, 1999 |
5 |
Studies of ion bombardment in high density plasmas containing CF4 Olthoff JK, Wang YC Journal of Vacuum Science & Technology A, 17(4), 1552, 1999 |
6 |
Electrical control of the spatial uniformity of reactive species in plasmas Sobolewski MA, Steffens KL Journal of Vacuum Science & Technology A, 17(6), 3281, 1999 |
7 |
Control of ion energy in a capacitively coupled reactive ion etcher Park HM, Garvin C, Grimard DS, Grizzle JW Journal of the Electrochemical Society, 145(12), 4247, 1998 |
8 |
Investigations in the sheath region of a radio frequency biased inductively coupled discharge Benck EC, Schwabedissen A, Gates A, Roberts JR Journal of Vacuum Science & Technology A, 16(1), 306, 1998 |
9 |
Measurement and error evaluation of electrical parameters at plasma relevant frequencies and impedances Garvin C, Grimard D, Grizzle J, Gilchrist BE Journal of Vacuum Science & Technology A, 16(2), 595, 1998 |
10 |
Simulations of BCl3/Cl-2/Ar plasmas with comparisons to diagnostic data Meeks E, Ho P, Ting AL, Buss RJ Journal of Vacuum Science & Technology A, 16(4), 2227, 1998 |