화학공학소재연구정보센터
검색결과 : 19건
No. Article
1 International round-robin inter-comparison of dye-sensitized and crystalline silicon solar cells
Chen CY, Ahn SK, Aoki D, Kokubo J, Yoon KH, Saito H, Lee KS, Magaino S, Takagi K, Lin LC, Lee KM, Wu CG, Zhou H, Igari S
Journal of Power Sources, 340, 309, 2017
2 Planar laser-induced fluorescence of CF2 in O-2/CF4 and O-2/C2F6 chamber-cleaning plasmas: Spatial uniformity and comparison to electrical measurements
Steffens KL, Sobolewski MA
Journal of Vacuum Science & Technology A, 17(2), 517, 1999
3 Langmuir probe measurements in a low pressure inductively coupled plasma used for diamond deposition
Okada K, Komatsu S, Matsumoto S
Journal of Vacuum Science & Technology A, 17(3), 721, 1999
4 Advances in broadband radio-frequency sensing for real-time control of plasma-based semiconductor processing
Garvin C, Grimard DS, Grizzle JW
Journal of Vacuum Science & Technology A, 17(4), 1377, 1999
5 Studies of ion bombardment in high density plasmas containing CF4
Olthoff JK, Wang YC
Journal of Vacuum Science & Technology A, 17(4), 1552, 1999
6 Electrical control of the spatial uniformity of reactive species in plasmas
Sobolewski MA, Steffens KL
Journal of Vacuum Science & Technology A, 17(6), 3281, 1999
7 Control of ion energy in a capacitively coupled reactive ion etcher
Park HM, Garvin C, Grimard DS, Grizzle JW
Journal of the Electrochemical Society, 145(12), 4247, 1998
8 Investigations in the sheath region of a radio frequency biased inductively coupled discharge
Benck EC, Schwabedissen A, Gates A, Roberts JR
Journal of Vacuum Science & Technology A, 16(1), 306, 1998
9 Measurement and error evaluation of electrical parameters at plasma relevant frequencies and impedances
Garvin C, Grimard D, Grizzle J, Gilchrist BE
Journal of Vacuum Science & Technology A, 16(2), 595, 1998
10 Simulations of BCl3/Cl-2/Ar plasmas with comparisons to diagnostic data
Meeks E, Ho P, Ting AL, Buss RJ
Journal of Vacuum Science & Technology A, 16(4), 2227, 1998