화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 A Kalman filter-based R2R control system with parallel stochastic disturbance models for semiconductor manufacturing processes
Kim H, Park JH, Lee KS
Journal of Process Control, 24(12), 119, 2014
2 Run-to-run control of inductively coupled C2F6 plasma etching of SiO2: Multivariable controller design and numerical application
Seo ST, Lee KS, Yang DR
Korean Journal of Chemical Engineering, 23(2), 199, 2006