| 1 |
Mechanisms of the structural modification of Ti films by pulsed direct current and inductively coupled plasma-assisted pulsed direct current sputtering
Kusano E, Kikuchi N
Thin Solid Films, 634, 73, 2017 |
| 2 |
Effect of moving speed during in-line pulsed direct-current magnetron sputtering deposition on the structural and optical properties of Al-doped ZnO films
Kim SY, Cho ES, Kwon SJ
Thin Solid Films, 638, 144, 2017 |
| 3 |
Process optimization of Al-doped zinc oxide films as a window layer for Cu(In,Ga)Se-2 thin film solar cells
Li ZH, Kwon SJ
Applied Surface Science, 284, 379, 2013 |
| 4 |
Bond and electrochromic properties of WO3 films deposited with horizontal DC, pulsed DC, and RF sputtering
Chen HC, Jan DJ, Chen CH, Huang KT
Electrochimica Acta, 93, 307, 2013 |
| 5 |
Effects of hydrogen atmosphere on pulsed-DC sputtered nanocrystalline Si:H films
Cherng JS, Chang SH, Hong SH
Materials Research Bulletin, 47(10), 3036, 2012 |
| 6 |
Effect of the duty ratio on the indium tin oxide (ITO) film deposited by in-line pulsed DC magnetron sputtering method for resistive touch panel
Ahn MH, Cho ES, Kwon SJ
Applied Surface Science, 258(3), 1242, 2011 |
| 7 |
Influence of sputtering atmosphere on polarity distribution of piezoelectric aluminum nitride thin films
Cherng JS, Chen TY
Current Applied Physics, 11(3), S371, 2011 |
| 8 |
Pulsed-DC sputtering of molybdenum bottom electrode and piezoelectric aluminum nitride films for bulk acoustic resonator applications
Cherng JS, Chen TY, Lin CM
Thin Solid Films, 519(20), 6797, 2011 |
| 9 |
Nanostructured tungsten and tungsten trioxide films prepared by glancing angle deposition
Deniz D, Frankel DJ, Lad RJ
Thin Solid Films, 518(15), 4095, 2010 |
| 10 |
Porous silicon oxide sacrificial layers deposited by pulsed-direct current magnetron sputtering for microelectromechanical systems
Olivares J, Clement M, Gonzalez-Castilla S, Vergara L, Iborra E, Sangrador J
Thin Solid Films, 518(18), 5128, 2010 |
