화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 In-situ Mueller matrix ellipsometry of silicon nanowires grown by plasma-enhanced vapor-liquid-solid method for radial junction solar cells
Mrazkova Z, Foldyna M, Misra S, Al-Ghzaiwat M, Postava K, Pistora J, Cabarrocas PRI
Applied Surface Science, 421, 667, 2017
2 In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe-Ni alloy substrate for photovoltaic applications
Mrazkova Z, Torres-Rios A, Ruggeri R, Foldyna M, Postava K, Pistora J, i Cabarrocas PR
Thin Solid Films, 571, 749, 2014
3 Selective sensitivity of ellipsometry to magnetic nanostructures
Postava K, Hrabovsky D, Hamrlova J, Pistora J, Wawro A, Baczewski LT, Sveklo I, Maziewski A
Thin Solid Films, 519(9), 2627, 2011
4 Depth-sensitive characterization of surface magnetic properties of as-quenched FeNbB ribbons
Zivotsky O, Postava K, Hrabovska K, Hendrych A, Pistora J, Kraus L
Applied Surface Science, 255(5), 3322, 2008
5 Influence of V and Mo overlayer on magneto-optical Kerr effect in ultrathin Co films
Postava K, Kurant Z, Maziewski A, Stupakiewic A, Baczewski LT, Wawro A, Aoyama M, Yamaguchi T
Applied Surface Science, 254(1), 360, 2007
6 Optical measurements of silicon wafer temperature
Postava K, Aoyama M, Mistrik J, Yamaguchi T, Shio K
Applied Surface Science, 254(1), 416, 2007
7 Spectroscopic ellipsometry of carbon nanotube formation in SiC surface decomposition
Matsumoto K, Maeda H, Kawaguchi Y, Takahashi K, Aoyama M, Yamaguchi T, Postava K
Thin Solid Films, 455-56, 339, 2004
8 Magneto-optical ellipsometry of systems containing thick layers
Postava K, Zivotsky O, Pistora J, Yamaguchi I
Thin Solid Films, 455-56, 615, 2004
9 Optical characterization of TiN/SiO2(1000 nm)/Si system by spectroscopic ellipsometry and reflectometry
Postava K, Aoyama M, Yamaguchi T
Applied Surface Science, 175, 270, 2001
10 Spectroellipsometric characterization of materials for multilayer coatings
Postava K, Aoyama M, Yamaguchi T, Oda H
Applied Surface Science, 175, 276, 2001