화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Chemical vapor deposition of tungsten silicide (WSix) for high aspect ratio applications
Sell B, Sanger A, Schulze-Icking G, Pomplun K, Krautschneider W
Thin Solid Films, 443(1-2), 97, 2003
2 Improved Auger electron spectroscopy sputter depth profiling of W/WNx and WSix layers on Si substrates
Goryachko A, Kruger D, Kurps R, Weidner G, Pomplun K
Journal of Vacuum Science & Technology A, 19(5), 2174, 2001