화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Surface polishing of AISI 304 stainless steel with micro plasma beam irradiation
Deng TT, Zheng ZZ, Li JJ, Xiong YB, Li JY
Applied Surface Science, 476, 796, 2019
2 Microbial inactivation and pesticide removal by remote exposure of atmospheric air plasma in confined environments
Heo NS, Lee MK, Kim GW, Lee SJ, Park JY, Park TJ
Journal of Bioscience and Bioengineering, 117(1), 81, 2014
3 Improvement in corrosion resistance of a nodular cast iron surface modified by plasma beam treatment
Cheng X, Hu SB, Song WL, Xiong XS
Applied Surface Science, 286, 334, 2013
4 The rubbing supplemented atmospheric plasma process for tunable liquid crystal alignment
Yaroshchuk OV, Kravchuk RM, Pogulay SS, Tsiolko VV, Kwok HS
Applied Surface Science, 257(7), 2443, 2011
5 Effect of gas introduction position on substrate etching by means of Ar-dominated graphite-cathodic-arc plasma beam in mu T-FAD
Tanoue H, Kamiya M, Oke S, Suda Y, Takikawa H, Hasegawa Y, Taki M, Tsuji N, Ishikawa T, Yasui H, Temmei S, Takahashi H
Thin Solid Films, 518(13), 3546, 2010
6 Radiofrequency plasma beam deposition of various forms of carbon based thin films and their characterization
Vizireanu S, Stoica SD, Mitu B, Husanu MA, Galca A, Nistor L, Dinescu G
Applied Surface Science, 255(10), 5378, 2009
7 Argon-dominated plasma beam generated by filtered vacuum arc and its substrate etching
Tanoue H, Kamiya M, Oke S, Suda Y, Takikawa H, Hasegawa Y, Taki M, Kumagai M, Kano M, Ishikawa T, Yasui H
Applied Surface Science, 255(17), 7780, 2009
8 Liquid crystal alignment on the two-directionally processed substrates: Comparison of mechanical rubbing and plasma beam alignment
Wu KY, Hwang J, Lee CY, Tang HC, Liu YL, Liu CH, Wei HK, Kou CS
Thin Solid Films, 517(2), 905, 2008
9 Properties of a-C : H films deposited from a methane electron cyclotron wave resonant plasma
Morrison NA, William C, Racine B, Milne WI, Martinez E, Esteve J, Andujar JL
Current Applied Physics, 3(5), 433, 2003
10 Growth of SiC Films on Si(100) by Electron-Cyclotron-Resonance Chemical-Vapor-Deposition Using SiH4/CH4/H-2
Liu CC, Lee CP, Cheng KL, Cheng HC, Yew TR
Journal of the Electrochemical Society, 142(12), 4279, 1995