검색결과 : 11건
No. | Article |
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1 |
Surface polishing of AISI 304 stainless steel with micro plasma beam irradiation Deng TT, Zheng ZZ, Li JJ, Xiong YB, Li JY Applied Surface Science, 476, 796, 2019 |
2 |
Microbial inactivation and pesticide removal by remote exposure of atmospheric air plasma in confined environments Heo NS, Lee MK, Kim GW, Lee SJ, Park JY, Park TJ Journal of Bioscience and Bioengineering, 117(1), 81, 2014 |
3 |
Improvement in corrosion resistance of a nodular cast iron surface modified by plasma beam treatment Cheng X, Hu SB, Song WL, Xiong XS Applied Surface Science, 286, 334, 2013 |
4 |
The rubbing supplemented atmospheric plasma process for tunable liquid crystal alignment Yaroshchuk OV, Kravchuk RM, Pogulay SS, Tsiolko VV, Kwok HS Applied Surface Science, 257(7), 2443, 2011 |
5 |
Effect of gas introduction position on substrate etching by means of Ar-dominated graphite-cathodic-arc plasma beam in mu T-FAD Tanoue H, Kamiya M, Oke S, Suda Y, Takikawa H, Hasegawa Y, Taki M, Tsuji N, Ishikawa T, Yasui H, Temmei S, Takahashi H Thin Solid Films, 518(13), 3546, 2010 |
6 |
Radiofrequency plasma beam deposition of various forms of carbon based thin films and their characterization Vizireanu S, Stoica SD, Mitu B, Husanu MA, Galca A, Nistor L, Dinescu G Applied Surface Science, 255(10), 5378, 2009 |
7 |
Argon-dominated plasma beam generated by filtered vacuum arc and its substrate etching Tanoue H, Kamiya M, Oke S, Suda Y, Takikawa H, Hasegawa Y, Taki M, Kumagai M, Kano M, Ishikawa T, Yasui H Applied Surface Science, 255(17), 7780, 2009 |
8 |
Liquid crystal alignment on the two-directionally processed substrates: Comparison of mechanical rubbing and plasma beam alignment Wu KY, Hwang J, Lee CY, Tang HC, Liu YL, Liu CH, Wei HK, Kou CS Thin Solid Films, 517(2), 905, 2008 |
9 |
Properties of a-C : H films deposited from a methane electron cyclotron wave resonant plasma Morrison NA, William C, Racine B, Milne WI, Martinez E, Esteve J, Andujar JL Current Applied Physics, 3(5), 433, 2003 |
10 |
Growth of SiC Films on Si(100) by Electron-Cyclotron-Resonance Chemical-Vapor-Deposition Using SiH4/CH4/H-2 Liu CC, Lee CP, Cheng KL, Cheng HC, Yew TR Journal of the Electrochemical Society, 142(12), 4279, 1995 |