화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 N-type doping of germanium epilayer on silicon by ex-situ phosphorus diffusion based on POCl3 phosphosilicate glass
Park CH, Pan H, Ishikawa Y, Wada K, Ahn D
Thin Solid Films, 662, 1, 2018
2 Passivating electron contact based on highly crystalline nanostructured silicon oxide layers for silicon solar cells
Stuckelberger J, Nogay G, Wyss P, Jeangros Q, Allebe C, Debrot F, Niquille X, Ledinsky M, Fejfar A, Despeisse M, Haug FJ, Loper P, Ballif C
Solar Energy Materials and Solar Cells, 158, 2, 2016
3 N+ emitters realized using Ammonium Dihydrogen Phosphate for silicon solar cells
Tang YH, Zhou CL, Wang WJ, Zhao Y, Zhou S, Fei JM, Cao HB
Solar Energy, 95, 265, 2013
4 Controlling surface shallow junction depth by a rapid thermal annealing process with low ambient pressure
Huang YJ, Liu CC, Lo KY, Chu SY
Applied Surface Science, 257(7), 2494, 2011