화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Plasma-surface interactions of advanced photoresists with C4F8/Ar discharges: Plasma parameter dependencies
Engelmann S, Bruce RL, Sumiya M, Kwon T, Phaneuf R, Oehrlein GS, Andes C, Graves D, Nest D, Hudson EA
Journal of Vacuum Science & Technology B, 27(1), 92, 2009
2 Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C4F8-and CF4-based discharges
Engelmann S, Bruce RL, Weilnboeck F, Sumiya M, Kwon T, Phaneuf R, Oehrlein GS, Andes C, Graves D, Nest D, Hudson EA
Journal of Vacuum Science & Technology B, 27(3), 1165, 2009
3 Plasma-surface interactions of model polymers for advanced photoresists using C4F8/Ar discharges and energetic ion beams
Engelmann S, Bruce RL, Kwon T, Phaneuf R, Oehrlein GS, Bae YC, Andes C, Graves D, Nest D, Hudson EA, Lazzeri P, Lacob E, Anderle M
Journal of Vacuum Science & Technology B, 25(4), 1353, 2007