검색결과 : 1건
No. | Article |
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1 |
Effects of post deposition annealing atmosphere on interfacial and electrical properties of HfO2/Ge3N4 gate stacks Mallem K, Chandra SVJ, Ju M, Dutta S, Phanchanan S, Sanyal S, Pham DP, Hussain SQ, Kim Y, Park J, Cho YH, Cho EC, Yi J Thin Solid Films, 675, 16, 2019 |