| 1 |
Dissolution behaviour of the barrier layer of porous oxide films on aluminum formed in phosphoric acid studied by a re-anodizing technique
Vrublevsky I, Parkoun V, Schreckenbach J, Goedel WA
Applied Surface Science, 252(14), 5100, 2006 |
| 2 |
Analysis of porous oxide film growth on aluminum in phosphoric acid using re-anodizing technique
Vrublevsky I, Parkoun V, Schreckenbach J
Applied Surface Science, 242(3-4), 333, 2005 |
| 3 |
Analysis of chemical dissolution of the barrier layer of porous oxide on aluminum thin films using a re-anodizing technique
Vrublevsky I, Parkoun V, Sokol V, Schreckenbach J
Applied Surface Science, 252(1), 227, 2005 |
| 4 |
The study of the volume expansion of aluminum during porous oxide formation at galvanostatic regime
Vrublevsky I, Parkoun V, Sokol V, Schreckenbach J, Marx G
Applied Surface Science, 222(1-4), 215, 2004 |
| 5 |
Study of porous oxide film growth on aluminum in oxalic acid using a re-anodizing technique
Vrubevsky I, Parkoun V, Schreckenbach J, Marx G
Applied Surface Science, 227(1-4), 282, 2004 |
| 6 |
Study of chemical dissolution of the barrier oxide layer of porous alumina films formed in oxalic acid using a re-anodizing technique
Vrublevsky I, Parkoun V, Sokol V, Schreckenbach J
Applied Surface Science, 236(1-4), 270, 2004 |
| 7 |
Effect of the current density on the volume expansion of the deposited thin films of aluminum during porous oxide formation
Vrublevsky I, Parkoun V, Schreckenbach J, Marx G
Applied Surface Science, 220(1-4), 51, 2003 |
