화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Tellurium doping of InGaP for tunnel junction applications in triple junction solar cells
Ebert C, Pulwin Z, Byrnes D, Paranjpe A, Zhang W
Journal of Crystal Growth, 315(1), 61, 2011
2 Investigation of MOCVD growth parameters on the quality of GaN epitaxial layers
Zhang XG, Soderman B, Armour E, Paranjpe A
Journal of Crystal Growth, 318(1), 436, 2011
3 Atomic layer deposition of AlOx for thin film head gap applications
Paranjpe A, Gopinath S, Omstead T, Bubber R
Journal of the Electrochemical Society, 148(9), G465, 2001
4 Ultralarge scale integrated metallization and interconnects
Whitman C, Moslehi MM, Paranjpe A, Velo L, Omstead T
Journal of Vacuum Science & Technology A, 17(4), 1893, 1999
5 Barrier Properties of Titanium Nitride Films Grown by Low-Temperature Chemical-Vapor-Deposition from Titanium Tetraiodide
Faltermeier C, Goldberg C, Jones M, Upham A, Manger D, Peterson G, Lau J, Kaloyeros AE, Arkles B, Paranjpe A
Journal of the Electrochemical Society, 144(3), 1002, 1997
6 Chemical-Vapor-Deposition Tin Process for Contact via Barrier Applications
Paranjpe A, Islamraja M
Journal of Vacuum Science & Technology B, 13(5), 2105, 1995