화학공학소재연구정보센터
검색결과 : 21건
No. Article
1 Plasmon Thin Film Transistor Using Plasma Polymerized Aniline-Rubrene-Gold Nanocomposite in One-Step Process
Biswasi S, Pal AR
Plasma Chemistry and Plasma Processing, 40(1), 371, 2020
2 Plasma Based Synthesis of Nanomaterials for Development of Plasmon Enhanced Infrared Responsive Optoelectronic Device
Gogoi D, Hussain AA, Pal AR
Plasma Chemistry and Plasma Processing, 39(1), 277, 2019
3 Atomic level understanding of site-specific interactions in Polyaniline/TiO2 composite
Chabungbam S, Loh GC, Sahariah MB, Pal AR, Pandey R
Chemical Physics Letters, 645, 144, 2016
4 Comparative study of structural, and optical properties of pulsed and RF plasma polymerized aniline films
Barman T, Pal AR, Chutia J
Applied Surface Science, 313, 286, 2014
5 Comparative study of nanocomposites prepared by pulsed and dc sputtering combined with plasma polymerization suitable for photovoltaic device applications
Hussain AA, Pal AR, Kar R, Bailung H, Chutia J, Patil DS
Materials Chemistry and Physics, 148(3), 540, 2014
6 Growth of nanocrystalline TiO2 thin films and crystal anisotropy of anatase phase deposited by direct current reactive magnetron sputtering
Sarma BK, Pal AR, Bailung H, Chutia J
Materials Chemistry and Physics, 139(2-3), 979, 2013
7 Role of ion energy on growth and optical dispersion of nanocrystalline TiO2 films prepared by magnetron sputtering with ion assistance at the substrate
Sarma BK, Pal AR, Bailung H, Chutia J
Applied Surface Science, 258(15), 5659, 2012
8 Plasma process for development of a bulk heterojunction optoelectronic device: A highly sensitive UV detector
Sharma S, Pal AR, Chutia J, Bailung H, Sarma NS, Dass NN, Patil D
Applied Surface Science, 258(20), 7897, 2012
9 Pulsed DC discharge for synthesis of conjugated plasma polymerized aniline thin film
Barman T, Pal AR
Applied Surface Science, 259, 691, 2012
10 Role of Plasma Parameters on the Conjugated Structure Retention in Polyaniline Thin Film
Hussain AA, Sharma S, Pal AR, Bailung H, Chutia J, Patil DS
Plasma Chemistry and Plasma Processing, 32(4), 817, 2012