검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
An Experimental Study of Plasma Cracking of Methane Using DBDs Aimed at Hydrogen Production Barni R, Benocci R, Spinicchia N, Roman HE, Riccardi C Plasma Chemistry and Plasma Processing, 39(1), 241, 2019 |
| 2 |
Characterization of a Plasma Jet Produced by Spark Discharges in Argon Air Mixtures at Atmospheric Pressure Barni R, Biganzoli I, Tassetti D, Riccardi C Plasma Chemistry and Plasma Processing, 34(6), 1415, 2014 |
| 3 |
ECR plasma etching of GaAs in CCl2F2/Ar/O-2 discharge and IR studies of the etched surface Singh LSS, Tiwary KP, Purohit RK, Zaidi ZH, Husain M Current Applied Physics, 5(4), 351, 2005 |
| 4 |
Absorption spectroscopy of SiH2 near 640 nm Escribano R, Campargue A Journal of Chemical Physics, 108(15), 6249, 1998 |
| 5 |
Remote plasma etching of silicon nitride and silicon dioxide using NF3/O-2 gas mixtures Kastenmeier BEE, Matsuo PJ, Oehrlein GS, Langan JG Journal of Vacuum Science & Technology A, 16(4), 2047, 1998 |
| 6 |
Global-Model for High-Pressure Electronegative Radiofrequency Discharges Lee YT, Lieberman MA, Lichtenberg AJ, Bose F, Baltes H, Patrick R Journal of Vacuum Science & Technology A, 15(1), 113, 1997 |
| 7 |
Kinetics of F Atoms and Fluorocarbon Radicals Studied by Threshold Ionization Mass-Spectrometry in a Microwave CF4 Plasma Tserepi A, Schwarzenbach W, Derouard J, Sadeghi N Journal of Vacuum Science & Technology A, 15(6), 3120, 1997 |
| 8 |
Effect of Co and CO2 Addition to the CF4/O-2 Gas System on the Etching of a Low-Pressure Chemical-Vapor-Deposition Tungsten Film Kwon SK, Kim KN, Nam CW, Woo SI Journal of Vacuum Science & Technology B, 13(3), 914, 1995 |
| 9 |
Effect of Substrate-Temperature on Dry-Etching of InP, GaAs, and AlGaAs in Iodine-Based and Bromine-Based Plasmas Chakrabarti UK, Ren F, Pearton SJ, Abernathy CR Journal of Vacuum Science & Technology A, 12(4), 1129, 1994 |