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| No. | Article |
|---|---|
| 1 |
Oxide Thickness-Dependence and Bias-Dependence of Postmetallization Annealing of Interface States in Metal-Oxide-Silicon Diodes Ragnarsson LA, Lundgren P, Ovuka Z, Andersson MO Journal of the Electrochemical Society, 144(5), 1866, 1997 |