화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Comparative study of charge trapping in high-dose Si and Ge-implanted Al/SiO2/Si structures
Nazarov A, Skorupa W, Osiyuk IN, Tjagulskii IP, Lysenko VS, Yankov RA, Gebel T
Journal of the Electrochemical Society, 152(2), F20, 2005
2 Interface trap properties of thermally oxidized n-type 4H-SiC and 6H-SiC
Rudenko TE, Osiyuk IN, Tyagulski IP, Olafsson HO, Sveinbjornsson EO
Solid-State Electronics, 49(4), 545, 2005
3 New evidence of interfacial oxide traps in n-type 4H-and 6H-SiC MOS structures
Olafsson HO, Sveinbjornsson EO, Rudenko TE, Kilchytska VI, Tyagulski IP, Osiyuk IN
Materials Science Forum, 389-3, 1001, 2002
4 A study of the shallow electron traps at the 4H-SiC/SiO2 interface
Olafsson HO, Sveinbjornsson EO, Rudenko TE, Kilchytska VI, Tyagulski IP, Osiyuk IN
Materials Science Forum, 433-4, 547, 2002
5 Thermally activated processes in the buried oxide of SIMOX SOI structures and devices
Lysenko VS, Nazarov AN, Kilchytska VI, Osiyuk IN, Tyagulski IP, Gomeniuk YV, Barchuk IP
Solid-State Electronics, 45(4), 575, 2001