화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system
Liddle JA, Blakey MI, Bolan K, Farrow RC, Gallatin GM, Kasica R, Katsap V, Knurek CS, Li J, Mkrtchyan M, Novembre AE, Ocola L, Orphanos PA, Peabody ML, Stanton ST, Teffeau K, Waskiewicz WK, Munro E
Journal of Vacuum Science & Technology B, 19(2), 476, 2001
2 Roughness study of a positive tone high performance SCALPEL resist
Ocola LE, Orphanos PA, Li WY, Waskiewicz W, Novembre AE, Sato M
Journal of Vacuum Science & Technology B, 18(6), 3435, 2000