화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Electron interactions with plasma processing gases: present status and future needs
Christophorou LG, Olthoff JK
Applied Surface Science, 192(1-4), 309, 2002
2 Electron transport, ionization, and attachment coefficients in C2F4 and C2F4/Ar mixtures
Goyette AN, de Urquijo J, Wang YC, Christophorou LG, Olthoff JK
Journal of Chemical Physics, 114(20), 8932, 2001
3 Ion compositions and energies in inductively coupled plasmas containing SF6
Goyette AN, Wang YC, Olthoff JK
Journal of Vacuum Science & Technology A, 19(4), 1294, 2001
4 Ion fluxes and energies in inductively coupled radio-frequency discharges containing C2F6 and c-C4F8
Goyette AN, Wang YC, Misakian M, Olthoff JK
Journal of Vacuum Science & Technology A, 18(6), 2785, 2000
5 Total electron scattering cross section for Cl-2
Cooper GD, Sanabia JE, Moore JH, Olthoff JK, Christophorou LG
Journal of Chemical Physics, 110(1), 682, 1999
6 Studies of ion bombardment in high density plasmas containing CF4
Olthoff JK, Wang YC
Journal of Vacuum Science & Technology A, 17(4), 1552, 1999