검색결과 : 6건
No. | Article |
---|---|
1 |
Electron interactions with plasma processing gases: present status and future needs Christophorou LG, Olthoff JK Applied Surface Science, 192(1-4), 309, 2002 |
2 |
Electron transport, ionization, and attachment coefficients in C2F4 and C2F4/Ar mixtures Goyette AN, de Urquijo J, Wang YC, Christophorou LG, Olthoff JK Journal of Chemical Physics, 114(20), 8932, 2001 |
3 |
Ion compositions and energies in inductively coupled plasmas containing SF6 Goyette AN, Wang YC, Olthoff JK Journal of Vacuum Science & Technology A, 19(4), 1294, 2001 |
4 |
Ion fluxes and energies in inductively coupled radio-frequency discharges containing C2F6 and c-C4F8 Goyette AN, Wang YC, Misakian M, Olthoff JK Journal of Vacuum Science & Technology A, 18(6), 2785, 2000 |
5 |
Total electron scattering cross section for Cl-2 Cooper GD, Sanabia JE, Moore JH, Olthoff JK, Christophorou LG Journal of Chemical Physics, 110(1), 682, 1999 |
6 |
Studies of ion bombardment in high density plasmas containing CF4 Olthoff JK, Wang YC Journal of Vacuum Science & Technology A, 17(4), 1552, 1999 |