검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Influence on Selective SiO2/Si Etching of Carbon-Atoms Produced by CH4 Addition to a C4F8 Permanent-Magnet Electron-Cyclotron-Resonance Etching Plasma Den S, Kuno T, Ito M, Hori M, Goto T, Okeeffe P, Hayashi Y, Sakamoto Y Journal of Vacuum Science & Technology A, 15(6), 2880, 1997 |
| 2 |
Transient Characteristics of Nitrogen Gas-Pulsed Electron-Cyclotron-Resonance Plasma Park YJ, Ozasa K, Okeeffe P, Aoyagi Y, Min SK Journal of Vacuum Science & Technology A, 14(5), 2814, 1996 |
| 3 |
Energy-Selective Electron-Cyclotron-Resonance Plasma for Controlled Surface-Reaction Processes Okeeffe P, Mutoh H, Den S, Hayashi Y, Komuro S, Morikawa T Thin Solid Films, 281-282, 102, 1996 |