화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Fast Diffusion of Water Molecules into Chemically Modified SiO2 Films Formed by Chemical Vapor Deposition
Ohtake A, Kobayashi K, Kurokawa S, Ohnishi O, Doi T
Chemistry Letters, 41(1), 60, 2012
2 The Polishing Technology for Glass Substrates Using Tribo-Chemical Reaction and Electrical Slurry Control
Ikeda H, Akagami Y, Uneda M, Ohnishi O, Kurokawa S, Doi TK
Journal of the Electrochemical Society, 159(4), H421, 2012
3 Analysis of Chemical and Mechanical Factors in CMP Processes for Improving Material Removal Rate
Tamai K, Morinaga H, Doi TK, Kurokawa S, Ohnishi O
Journal of the Electrochemical Society, 158(3), H333, 2011