검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Evaluation of extreme-ultraviolet lithography mask absorber pattern on multilayer phase defect using extreme-ultraviolet microscope Hamamoto K, Sakaya N, Hosoya M, Kureishi M, Ohkubo R, Shoki T, Nagarekawa O, Kishimoto J, Watanabe T, Kinoshita H Journal of Vacuum Science & Technology B, 27(4), 1938, 2009 |
| 2 |
Damage-free extreme ultraviolet mask with TaBN absorber Shoki T, Kinoshita T, Sakaya N, Hosoya M, Ohkubo R, Usui Y, Kobayshi H, Nagarekawa O Journal of Vacuum Science & Technology B, 21(6), 3021, 2003 |
| 3 |
Nanometer scattered-light alignment system using SiC x-ray masks with low optical transparency Miyatake T, Hirose M, Shoki T, Ohkubo R, Yamazaki K Journal of Vacuum Science & Technology B, 16(6), 3471, 1998 |
| 4 |
Evaluation of alignment accuracy in processed wafers and SiC masks on a scattered-light alignment system for x-ray aligners Miyatake T, Hirose M, Shoki T, Ohkubo R, Yamazaki K Journal of Vacuum Science & Technology B, 15(6), 2471, 1997 |
| 5 |
Accelerated Radiation-Damage Studies of Antireflection Materials on SiC X-Ray Mask Membrane Shoki T, Ohkubo R, Kosuga H, Yamaguchi Y, Annaka N, Wells GM, Yamazaki K, Cerrina F Journal of Vacuum Science & Technology B, 12(6), 3995, 1994 |