화학공학소재연구정보센터
검색결과 : 24건
No. Article
1 Carbon-Cap for Ohmic Contacts on Ion-Implanted 4H-SiC
Nipoti R, Mancarella F, Moscatelli F, Rizzoli R, Zampolli S, Ferri M
Electrochemical and Solid State Letters, 13(12), H432, 2010
2 Silane overpressure post-implant annealing of Al dopants in SiC: Cold wall CVD apparatus
Rao S, Bergamini F, Nipoti R, Saddow SE
Applied Surface Science, 252(10), 3837, 2006
3 Ar annealing at 1600 degrees C and 1650 degrees C of Al+ implanted p(+)/n 4H-SiC diodes: Analysis of the J-V characteristics versus annealing temperature
Bergamini F, Moscatelli F, Canino M, Poggi A, Nipoti R
Materials Science Forum, 483, 625, 2005
4 J-v characteristics of Al+ ion implanted p(+)/n 4H-SiC diodes annealed in silane ambient at 1600 degrees C
Bergamini A, Rao SP, Saddow SE, Nipoti R
Materials Science Forum, 483, 629, 2005
5 n(+)/p diodes realized in SiC by phosphorus ion implantation: Electrical characterization as a function of temperature
Canino M, Castaldini A, Cavallini A, Moscatelli F, Nipoti R, Poggi A
Materials Science Forum, 483, 649, 2005
6 Competition between oxidation and recrystallization in ion amorphized (0001) 6H-SIC
Poggi A, Parisini A, Solmi S, Nipoti R
Materials Science Forum, 483, 665, 2005
7 Ni-silicide contacts to 6H-SiC: Contact resistivity and barrier height on ion implanted n-type and barrier height on p-type epilayer
Moscatelli F, Scorzoni A, Poggi A, Canino M, Nipoti R
Materials Science Forum, 483, 737, 2005
8 Measurements of charge collection efficiency of p(+)/n junction SiC detectors
Moscatelli F, Scorzoni A, Poggi A, Bruzzi M, Lagomarsino S, Mersi S, Sciortino S, Lazar M, Di Placido A, Nipoti R
Materials Science Forum, 483, 1021, 2005
9 Structural characterization of alloyed Al/Ti and Ti contacts on SiC
Parisini A, Poggi A, Nipoti R
Materials Science Forum, 457-460, 837, 2004
10 Contact resistivity and barrier height of Al/Ti ohmic contacts on p-type ion implanted 4H-and 6H-SiC
Scorzoni A, Moscatelli F, Poggi A, Cardinali GC, Nipoti R
Materials Science Forum, 457-460, 881, 2004