검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Analysis of high-k hfO(2) and HfSiO4 dielectric films Nieveen W, Schueler BW, Goodman G, Schnabel P, Moskito J, Mowat I, Chao G Applied Surface Science, 231-2, 556, 2004 |
| 2 |
Atomic layer deposition of hafnium oxide and hafnium silicate thin films using liquid precursors and ozone Senzaki Y, Park S, Chatham H, Bartholomew L, Nieveen W Journal of Vacuum Science & Technology A, 22(4), 1175, 2004 |
| 3 |
SiO2 thickness determination by x-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectrometry, Rutherford backscattering, transmission electron microscopy, and ellipsometry Cole DA, Shallenberger JR, Novak SW, Moore RL, Edgell MJ, Smith SP, Hitzman CJ, Kirchhoff JF, Principe E, Nieveen W, Huang FK, Biswas S, Bleiler RJ, Jones K Journal of Vacuum Science & Technology B, 18(1), 440, 2000 |