화학공학소재연구정보센터
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No. Article
1 Annealing of amorphous Ir18Si15O67 films in dry oxygen
Giauque PH, Cherry HB, Nicolet MA, Bernard C, Pisch A
Thin Solid Films, 406(1-2), 299, 2002
2 Thermal stability of amorphous thin films: Ti3Si1O8 vs. TiO2 and mictamict compounds
Giauque PH, Cherry HB, Nicolet MA
Thin Solid Films, 394(1-2), 136, 2001
3 Instability of amorphous Ru-Si-O thin films under thermal oxidation
Gasser SM, Ruiz R, Kolawa E, Nicolet MA
Journal of the Electrochemical Society, 146(4), 1546, 1999
4 Thermal reaction of Pt film with < 110 > GaN epilayer
Gasser SM, Kolawa E, Nicolet MA
Journal of Vacuum Science & Technology A, 17(5), 2642, 1999
5 Moving species in Ti34Si23N43 oxidation
Kacsich T, Nicolet MA
Thin Solid Films, 349(1-2), 1, 1999
6 Texture of copper films on Ta35Si18N47 and Ti33Si23N44 underlayers
Tsuji Y, Gasser SM, Kolawa E, Nicolet MA
Thin Solid Films, 350(1-2), 1, 1999
7 Growth and properties of W-Si-N diffusion barriers deposited by chemical vapor deposition
Fleming JG, Roherty-Osmun E, Smith PM, Custer JS, Kim YD, Kacsich T, Nicolet MA, Galewski CJ
Thin Solid Films, 320(1), 10, 1998
8 Model of Oxidation of Tin in Ion-Beam-Assisted Deposition Process
Kubota H, Easterbrook M, Tokunaga M, Sakata I, Nagata M, Nicolet MA
Thin Solid Films, 281-282, 108, 1996
9 Gold Metallization for Aluminum Nitride
Shalish I, Gasser SM, Kolawa E, Nicolet MA, Ruiz RP
Thin Solid Films, 289(1-2), 166, 1996
10 Method for Fabricating a Low-Stress X-Ray Mask Using Annealable Amorphous Refractory Compounds
Dauksher WJ, Resnick DJ, Cummings KD, Baker J, Gregory RB, Theodore ND, Chan JA, Johnson WA, Mogab CJ, Nicolet MA, Reid JS
Journal of Vacuum Science & Technology B, 13(6), 3103, 1995