검색결과 : 15건
No. | Article |
---|---|
1 |
Organic Glasses of High Glass Transition Temperatures Due To Substitution with Nitrile Groups Krohn F, Neuber C, Rossler EA, Schmidt HW Journal of Physical Chemistry B, 123(48), 10286, 2019 |
2 |
Sub-30 nm patterning of molecular resists based on crosslinking through tip based oxidation Lorenzoni M, Wagner D, Neuber C, Schmidt HW, Perez-Murano F Applied Surface Science, 442, 106, 2018 |
3 |
Controlled Wrinkling of Gradient Metal Films Schedl AE, Neuber C, Fery A, Schmidt HW Langmuir, 34(47), 14249, 2018 |
4 |
Athermal Azobenzene-Based Nanoimprint Lithography Probst C, Meichner C, Kreger K, Kador L, Neuber C, Schmidt HW Advanced Materials, 28(13), 2624, 2016 |
5 |
Optical imaging of COX-2: Studies on an autofluorescent 2,3-diaryl-substituted indole-based cyclooxygenase-2 inhibitor Tondera C, Ullm S, Laube M, Meister S, Neuber C, Mosch B, Kniess T, Pietzsch J Biochemical and Biophysical Research Communications, 458(1), 40, 2015 |
6 |
Fast Diffusion-Limited Lyotropic Phase Transitions Studied in Situ Using Continuous Flow Microfluidics/Microfocus-SAXS With S, Trebbin M, Bartz CBA, Neuber C, Dulle M, Yu S, Roth SV, Schmidt HW, Forster S Langmuir, 30(42), 12494, 2014 |
7 |
Multicomponent Physical Vapor Deposited Films with Homogeneous Molecular Material Distribution Featuring Improved Resist Sensitivity Kolb T, Neuber C, Krysak M, Ober CK, Schmidt HW Advanced Functional Materials, 22(18), 3865, 2012 |
8 |
Tailored Star Block Copolymer Architecture for High Performance Chemically Amplified Resists Wieberger F, Neuber C, Ober CK, Schmidt HW Advanced Materials, 24(44), 5939, 2012 |
9 |
Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography Bauer WAC, Neuber C, Ober CK, Schmidt HW Advanced Materials, 23(45), 5404, 2011 |
10 |
Physical vapor deposition of molecular glass photoresists: A new route to chemically amplified patterning Pfeiffer F, Felix NM, Neuber C, Ober CK, Schmidt HW Advanced Functional Materials, 17(14), 2336, 2007 |