화학공학소재연구정보센터
검색결과 : 15건
No. Article
1 Organic Glasses of High Glass Transition Temperatures Due To Substitution with Nitrile Groups
Krohn F, Neuber C, Rossler EA, Schmidt HW
Journal of Physical Chemistry B, 123(48), 10286, 2019
2 Sub-30 nm patterning of molecular resists based on crosslinking through tip based oxidation
Lorenzoni M, Wagner D, Neuber C, Schmidt HW, Perez-Murano F
Applied Surface Science, 442, 106, 2018
3 Controlled Wrinkling of Gradient Metal Films
Schedl AE, Neuber C, Fery A, Schmidt HW
Langmuir, 34(47), 14249, 2018
4 Athermal Azobenzene-Based Nanoimprint Lithography
Probst C, Meichner C, Kreger K, Kador L, Neuber C, Schmidt HW
Advanced Materials, 28(13), 2624, 2016
5 Optical imaging of COX-2: Studies on an autofluorescent 2,3-diaryl-substituted indole-based cyclooxygenase-2 inhibitor
Tondera C, Ullm S, Laube M, Meister S, Neuber C, Mosch B, Kniess T, Pietzsch J
Biochemical and Biophysical Research Communications, 458(1), 40, 2015
6 Fast Diffusion-Limited Lyotropic Phase Transitions Studied in Situ Using Continuous Flow Microfluidics/Microfocus-SAXS
With S, Trebbin M, Bartz CBA, Neuber C, Dulle M, Yu S, Roth SV, Schmidt HW, Forster S
Langmuir, 30(42), 12494, 2014
7 Multicomponent Physical Vapor Deposited Films with Homogeneous Molecular Material Distribution Featuring Improved Resist Sensitivity
Kolb T, Neuber C, Krysak M, Ober CK, Schmidt HW
Advanced Functional Materials, 22(18), 3865, 2012
8 Tailored Star Block Copolymer Architecture for High Performance Chemically Amplified Resists
Wieberger F, Neuber C, Ober CK, Schmidt HW
Advanced Materials, 24(44), 5939, 2012
9 Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography
Bauer WAC, Neuber C, Ober CK, Schmidt HW
Advanced Materials, 23(45), 5404, 2011
10 Physical vapor deposition of molecular glass photoresists: A new route to chemically amplified patterning
Pfeiffer F, Felix NM, Neuber C, Ober CK, Schmidt HW
Advanced Functional Materials, 17(14), 2336, 2007