| 1 |
Study of low-defect and strain-relaxed GeSn growth via reduced pressure CVD in H-2 and N-2 carrier gas
Margetis J, Mosleh A, Al-Kabi S, Ghetmiri SA, Du W, Dou W, Benamara M, Li B, Mortazavi M, Naseem HA, Yu SQ, Tolle J
Journal of Crystal Growth, 463, 128, 2017 |
| 2 |
Fabrication of horizontally grown silicon nanowires using a thin aluminum film as a catalyst
Mohammed HK, Abu-Safe H, Newton B, El-Ghazaly S, Naseem HA
Thin Solid Films, 519(5), 1681, 2010 |
| 3 |
Corrigendum to "The effect of hydrogen in the mechanism of aluminium-induced crystallization of sputtered amorphous silicon using scanning auger microanalysis"
Hossain M, Meyer HM, Abu-Safe HH, Naseem HA, Brown WD
Thin Solid Films, 516(1), 106, 2007 |
| 4 |
Interfacial diffusion effect on metal induced crystallization of an amorphous silicon - A microstructural pathway
Srivastava AK, Sood KN, Kishore R, Naseem HA
Electrochemical and Solid State Letters, 9(7), G219, 2006 |
| 5 |
Atomic force microscopy and x-ray diffraction studies of aluminum-induced crystallization of amorphous silicon in Al/alpha-SiM, alpha-Si : H/Al, and Al/alpha-Si : H/Al thin film structures
Kishore R, Shaik A, Naseem HA, Brown WD
Journal of Vacuum Science & Technology B, 21(3), 1037, 2003 |
| 6 |
Microstructural and analytical investigation of low temperature crystallized amorphous silicon/crystallized silicon interface using SEM and EDS
Kishore R, Sood KN, Naseem HA
Journal of Materials Science Letters, 21(8), 647, 2002 |
| 7 |
Influence of nitrogen trifluoride and nitrogen plasma treatment on the formation of hillocks during aluminum induced crystallization of a-Si : H
Al-Dhafiri AM, El-Jammal HA, Al-Shariah A, Naseem HA, Brown WD
Thin Solid Films, 422(1-2), 14, 2002 |
| 8 |
Aluminum-induced crystallization of amorphous silicon (alpha-Si : H) at 150 degrees C
Kishore R, Hotz C, Naseem HA, Brown WD
Electrochemical and Solid State Letters, 4(2), G14, 2001 |
| 9 |
Effect of early methane introduction on the properties of nano-seeded MPCVD-diamond films
Shaik AA, Khan MA, Naseem HA, Brown WD
Thin Solid Films, 355-356, 139, 1999 |
| 10 |
In situ analysis of aluminum enhanced crystallization of hydrogenated amorphous silicon (a-Si : H) using X-ray diffraction
Khalifa FA, Naseem HA, Shultz JL, Brown WD
Thin Solid Films, 355-356, 343, 1999 |
