1 |
Accelerated entry of hydrogen into iron from NaOH solutions at low cathodic and low anodic polarisations Flis-Kabulska I, Zakroczymski T, Flis J Electrochimica Acta, 52(9), 2966, 2007 |
2 |
Pb deposition on n-Si(111) electrodes Ziegler JC, Wielgosz RI, Kolb DM Electrochimica Acta, 45(4-5), 827, 1999 |
3 |
Electrodissolution and passivation of silicon in aqueous alkaline media: A voltammetric and impedance investigation Cattarin S, Musiani MM Journal of Physical Chemistry B, 103(16), 3162, 1999 |
4 |
Influence of the forming electrolyte on the electrical properties of tantalum and niobium oxide films: an EIS comparative study Cavigliasso GE, Esplandiu MJ, Macagno VA Journal of Applied Electrochemistry, 28(11), 1213, 1998 |
5 |
Tribochemical reactions of silicon : An in situ infrared spectroscopy characterization Muratov VA, Olsen JE, Gallois BM, Fischer TE, Bean JC Journal of the Electrochemical Society, 145(7), 2465, 1998 |
6 |
Kinetic isotopic effects in the anisotropic etching of p-Si(100) in alkaline solutions Baum T, Schiffrin DJ Journal of Electroanalytical Chemistry, 436(1-2), 239, 1997 |
7 |
Investigation of the Processes of Electron Injection During Dissolution of P-Si in Acidic Fluoride and Alkaline Media Cattarin S, Peter LM, Riley DJ Journal of Physical Chemistry B, 101(20), 4071, 1997 |
8 |
In-Situ FTIR Investigation of the Electrochemical Microstructuring of N-Si(111) Rappich J, Lewerenz HJ Electrochimica Acta, 41(5), 675, 1996 |
9 |
Energetics and Kinetics of Surface-States at N-Type Silicon Surfaces in Aqueous Fluoride Solutions Oskam G, Hoffmann PM, Schmidt JC, Searson PC Journal of Physical Chemistry, 100(5), 1801, 1996 |
10 |
Surface-Morphology of P-Type (100)Silicon Etched in Aqueous Alkaline-Solution Bressers PM, Kelly JJ, Gardeniers JG, Elwenspoek M Journal of the Electrochemical Society, 143(5), 1744, 1996 |