검색결과 : 1건
No. | Article |
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1 |
Modification of the oxide/semiconductor interface by high temperature NO treatments: A combined EPR, NRA and XPS study on oxidized porous and bulk n-type 4H-SiC von Bardeleben HJ, Cantin JL, Vickridge IC, Song YW, Dhar S, Feldman LC, Williams JR, Ke L, Shishkin Y, Devaty RP, Choyke WJ Materials Science Forum, 483, 277, 2005 |