화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 4H-SiC surface energy tuning by nitrogen up-take
Pitthan E, Amarasinghe VP, Xu C, Gustafsson T, Stedile FC, Feldman LC
Applied Surface Science, 402, 192, 2017
2 High temperature NO annealing of deposited SiO2 and SiON films on n-type 4H-SiC
Yano H, Hatayama T, Uraoka Y, Fuyuki T
Materials Science Forum, 483, 685, 2005
3 930V, 170m Omega.cm(2) lateral two-zone RESURF MOSFETs in 4H-SiC with NO annealing
Wang W, Banerjee S, Chow TP, Gutmann RJ
Materials Science Forum, 457-460, 1413, 2004
4 Effect of process variations on 4H silicon carbide n-channel MOSFET mobilities
Lu CY, Cooper JA, Chung GY, Williams JR, McDonald K, Feldman LC
Materials Science Forum, 389-3, 977, 2002
5 Large-area (3.3 mm x 3.3 mm) power MOSFETs in 4H-SiC
Ryu SH, Agarwal A, Richmond J, Das M, Lipkin L, Palmour J, Saks N, Williams J
Materials Science Forum, 389-3, 1195, 2002