검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Simulation of roughness in chemically amplified resists using percolation theory Patsis GP, Glezos N, Raptis I, Valamontes ES Journal of Vacuum Science & Technology B, 17(6), 3367, 1999 |
| 2 |
Top surface imaging process and materials development for 193 nm and extreme ultraviolet lithography Rao V, Hutchinson J, Holl S, Langston J, Henderson C, Wheeler DR, Cardinale G, O'Connell D, Goldsmith J, Bohland J, Taylor G, Sinta R Journal of Vacuum Science & Technology B, 16(6), 3722, 1998 |
| 3 |
Accurate critical dimension control by using an azide/novolak resist process for electron-beam lithography Yamamoto J, Uchino S, Ohta H, Yoshimura T, Murai F Journal of Vacuum Science & Technology B, 15(6), 2868, 1997 |
| 4 |
Acid-Diffusion Suppression in Chemical Amplification Resists by Controlling Acid-Diffusion Channels in Base Matrix Polymers Yoshimura T, Shiraishi H, Terasawa T, Okazaki S Journal of Vacuum Science & Technology B, 14(6), 4216, 1996 |