검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Next-generation virtual metrology for semiconductor manufacturing: A feature-based framework Suthar K, Shah D, Wang J, He QP Computers & Chemical Engineering, 127, 140, 2019 |
| 2 |
On the application of interval PCA to process monitoring: A robust strategy for sensor FDI with new efficient control statistics Ait-Izem T, Harkat MF, Djeghaba M, Kratz F Journal of Process Control, 63, 29, 2018 |
| 3 |
A Kernel Sparse Representation Based Framework for Monitoring Nonlinear Multi-Mode Process Huang ZW, Zeng JS, Pan GB, Xie L Journal of Chemical Engineering of Japan, 50(9), 737, 2017 |