화학공학소재연구정보센터
검색결과 : 17건
No. Article
1 Bactericidal and Fungicidal Activity in the Gas Phase of Sodium Dichloroisocyanurate (NaDCC)
Proto A, Zarrella I, Cucciniello R, Pironti C, De Caro F, Motta O
Current Microbiology, 73(2), 287, 2016
2 Microflow photo-radical chlorination of cycloalkanes
Matsubara H, Hino Y, Tokizane M, Ryu I
Chemical Engineering Journal, 167(2-3), 567, 2011
3 Effect of inert gas additive on Cl-2-based inductively coupled plasma etching of NiFe and NiFeCo
Jung KB, Cho H, Hahn YB, Hays DC, Lambers ES, Park YD, Feng T, Childress JR, Pearton SJ
Journal of Vacuum Science & Technology A, 17(4), 2223, 1999
4 High-aspect-ratio nanophotonic components fabricated by Cl-2 reactive ion beam etching
Zubrzycki WJ, Vawter GA, Wendt JR
Journal of Vacuum Science & Technology B, 17(6), 2740, 1999
5 193 nm photodynamics of NO in rare gas matrices : Fluorescence, thermoluminescence, and photodissociation
Eloranta J, Vaskonen K, Hakkanen H, Kiljunen T, Kunttu H
Journal of Chemical Physics, 109(18), 7784, 1998
6 Laser Single-Photon Ionization Mass-Spectrometry Measurements of Sicl and Sicl2 During Thermal Etching of Si(100)
Materer N, Goodman RS, Leone SR
Journal of Vacuum Science & Technology A, 15(4), 2134, 1997
7 Mass-Resolved Multiphoton Ionization Spectroscopy of Jet-Cooled Cl-2- .1. Bound-Free-Bound Spectroscopy
Alkahali MS, Donovan RJ, Lawley KP, Min ZY, Ridley T
Journal of Chemical Physics, 104(5), 1825, 1996
8 Viscosity-Dependent Behavior of Geminate Caged-Pairs in Supercritical-Fluid Solvent
Tanko JM, Suleman NK, Fletcher B
Journal of the American Chemical Society, 118(47), 11958, 1996
9 A Simple Optical-Emission Method for Measuring Percent Dissociations of Feed Gases in Plasmas - Application to Cl-2 in a High-Density Helical Resonator Plasma
Donnelly VM
Journal of Vacuum Science & Technology A, 14(3), 1076, 1996
10 Ion-Assisted Si/Xef2-Etching - Influence of Ion/Neutral Flux Ratio and Ion Energy
Vugts MJ, Hermans LJ, Beijerinck HC
Journal of Vacuum Science & Technology A, 14(4), 2138, 1996