검색결과 : 21건
| No. | Article |
|---|---|
| 1 |
Analyses of Diamond Disk Substrate Wear and Diamond Microwear in Copper Chemical Mechanical Planarization Process Meled A, Zhuang Y, Wei X, Cheng J, Sampurno YA, Borucki L, Moinpour M, Hooper D, Philipossian A Journal of the Electrochemical Society, 157(3), H250, 2010 |
| 2 |
Oxygen plasma damage to blanket and patterned ultralow-kappa surfaces Bao J, Shi H, Huang H, Ho PS, McSwiney ML, Goodner MD, Moinpour M, Kloster GM Journal of Vacuum Science & Technology A, 28(2), 207, 2010 |
| 3 |
Copper CMP with Composite Polymer Core-Silica Shell Abrasives: A Defectivity Study Armini S, Whelan CM, Moinpour M, Maex K Journal of the Electrochemical Society, 156(1), H18, 2009 |
| 4 |
Controlling Scratching in Cu Chemical Mechanical Planarization Eusner T, Saka N, Chun JH, Armini S, Moinpour M, Fischer P Journal of the Electrochemical Society, 156(7), H528, 2009 |
| 5 |
Synchronous, In Situ Measurements in Chemical Mechanical Planarization Vlahakis J, Rogers C, Manno VP, White R, Moinpour M, Hooper D, Anjur S Journal of the Electrochemical Society, 156(10), H794, 2009 |
| 6 |
In Situ Investigation of Slurry Flow Fields during CMP Mueller N, Rogers C, Manno VP, White R, Moinpour M Journal of the Electrochemical Society, 156(12), H908, 2009 |
| 7 |
Mixed organic/inorganic abrasive particles during oxide CMP Armini S, Whelan CM, Moinpour M, Maex K Electrochemical and Solid State Letters, 11(7), H197, 2008 |
| 8 |
Interaction forces between a glass surface and ceria-modified PMMA-Based abrasives for CMP measured by colloidal probe AFM Armini S, Burtovyy R, Moinpour M, Luzinov I, De Messemaeker J, Whelan CM, Maex K Journal of the Electrochemical Society, 155(4), H218, 2008 |
| 9 |
Composite polymer core-silica shell abrasives: The effect of the shape of the silica particles on oxide CMP Armini S, Whelan CM, Moinpour M, Maex K Journal of the Electrochemical Society, 155(6), H401, 2008 |
| 10 |
Composite polymer core-ceria shell abrasive particles during oxide CMP: A defectivity study Armini S, De Messemaeker J, Whelan CM, Moinpour M, Maex K Journal of the Electrochemical Society, 155(9), H653, 2008 |