검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Long-term reproducibility of relative sensitivity factors obtained with CAMECA Wf Gui D, Xing ZX, Huang YH, Mo ZQ, Hua YN, Zhao SP, Cha LZ Applied Surface Science, 255(4), 1427, 2008 |
| 2 |
Roughness development in the depth profiling with 500 eV O-2(+) beam with the combination of oxygen flooding and sample rotation Gui D, Xing ZX, Huang YH, Mo ZQ, Hua YN, Zhao SP, Cha LZ Applied Surface Science, 255(4), 1433, 2008 |
| 3 |
Depth profiling of ultra-thin oxynitride gate dielectrics by using MCs2+ technique Gui D, Mo ZQ, Xing ZX, Huang YH, Hua YN, Zhao SP, Cha LZ Applied Surface Science, 255(4), 1437, 2008 |
| 4 |
Effect of plasma process on low-k material and barrier layer performance Chen XT, Gui D, Mo ZQ, Du AY, Chi DZ, Wang WD, Wang YH, Lu D, Tang LJ, Li WH, Wong LY Thin Solid Films, 504(1-2), 248, 2006 |
| 5 |
Analysis of amine contamination on silicon oxide surfaces using ToF-SIMS Lu D, Mo ZQ, Xing ZX, Gui D Applied Surface Science, 233(1-4), 352, 2004 |
| 6 |
Effect of ammonia plasma pretreatment on silicon-nitride barriers for Cu metallization systems Qin W, Mo ZQ, Tang LJ, Yu B, Wang SR, Xie J Journal of Vacuum Science & Technology B, 19(5), 1942, 2001 |
| 7 |
Effects of nitrogen fraction on the structure of amorphous silicon-carbon-nitrogen alloys Gao Y, Wei J, Zhang DH, Mo ZQ, Hing P, Shi X Thin Solid Films, 377-378, 562, 2000 |
| 8 |
Influence of silane partial pressure on the properties of amorphous SiCN films prepared by ECR-CVD Zhang DH, Gao Y, Wei J, Mo ZQ Thin Solid Films, 377-378, 607, 2000 |